US Patent Issued to Applied Materials on Dec. 23 for "Method and apparatus for digital control of ion energy distribution in a plasma" (California Inventors)

ALEXANDRIA, Va., Dec. 23 -- United States Patent no. 12,505,982, issued on Dec. 23, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Method and apparatus for digital control of ion energy distribution in a plasma" was invented by Kartik Ramaswamy (San Jose, Calif.), Yang Yang (Cupertino, Calif.) and Yue Guo (Redwood City, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments provided herein generally include apparatus, plasma processing systems and methods for generation of a waveform for plasma processing of a substrate in a processing chamber. Embodiments of the disclosure include an apparatus and method for generating a pseudo-staircase waveform that includes coupling, during a f...