US Patent Issued to Applied Materials on Dec. 2 for "Methods for calibrating an optical emission spectrometer" (American, Chinese Inventors)

ALEXANDRIA, Va., Dec. 2 -- United States Patent no. 12,487,121, issued on Dec. 2, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Methods for calibrating an optical emission spectrometer" was invented by Kin Pong Lo (Fremont, Calif.), Lara Hawrylchak (Gilroy, Calif.), Malcolm J. Bevan (Santa Clara, Calif.), Theresa Kramer Guarini (San Jose, Calif.), Wei Liu (Beijing) and Bernard L. Hwang (Santa Clara, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "One or more embodiments described herein generally relate to systems and methods for calibrating an optical emission spectrometer (OES) used for processing semiconductor substrates. In embodiments herein, a light fixture is mounted to a plate ...