US Patent Issued to Applied Materials on Dec. 16 for "Systems and methods for depositing low-K dielectric films" (California Inventors)

ALEXANDRIA, Va., Dec. 16 -- United States Patent no. 12,500,080, issued on Dec. 16, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Systems and methods for depositing low-K dielectric films" was invented by Shruba Gangopadhyay (San Jose, Calif.), Bhaskar Jyoti Bhuyan (San Jose, Calif.), Michael Haverty (Mountain View, Calif.), Bo Xie (Sunnyvale, Calif.), Li-Qun Xia (Cupertino, Calif.), Rui Lu (Santa Clara, Calif.), Yijun Liu (Sunnyvale, Calif.), Ruitong Xiong (San Jose, Calif.), Xiaobo Li (San Jose, Calif.), Lakmal C. Kalutarage (San Jose, Calif.) and Lauren Bagby (Palo Alto, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments include semiconductor processing methods to form low-...