US Patent Issued to Applied Materials on Aug. 5 for "Model based dynamic positional correction for digital lithography tools" (California Inventors)

ALEXANDRIA, Va., Aug. 6 -- United States Patent no. 12,379,671, issued on Aug. 5, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Model based dynamic positional correction for digital lithography tools" was invented by Tamer Coskun (San Jose, Calif.), Muhammet Poyraz (Santa Clara, Calif.), Qin Zhong (Santa Clara, Calif.) and Pacha Mongkolwongrojn (Fremont, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure generally relates to photolithography systems, and methods for correcting positional errors in photolithography systems. When a photolithography system is first started, the system enters a stabilization period. During the stabilization period, positional readings a...