US Patent Issued to Applied Materials on Aug. 5 for "Ion implantation to modify glass locally for optical devices" (California Inventors)

ALEXANDRIA, Va., Aug. 6 -- United States Patent no. 12,378,662, issued on Aug. 5, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Ion implantation to modify glass locally for optical devices" was invented by Nai-Wen Pi (San Jose, Calif.), Jinxin Fu (Fremont, Calif.), Kang Luo (San Jose, Calif.) and Ludovic Godet (Sunnyvale, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments described herein provide for optical devices with methods of forming optical device substrates having at least one area of increased refractive index or scratch resistance. One method includes disposing an etch material on a discrete area of an optical device substrate or an optical device layer, disposing a ...