ALEXANDRIA, Va., Aug. 26 -- United States Patent no. 12,400,833, issued on Aug. 26, was assigned to APPLIED MATERIALS Inc. (Santa Clara, Calif.).
"Methods and apparatus for processing a substrate" was invented by Abhishek Chowdhury (Bangalore, India), Jon Christian Farr (Tempe, Ariz.), Ravikumar Patil (Bengaluru, India), Eller Juco (San Jose, Calif.), Yi Zheng (Sunnyvale, Calif.) and Siqing Lu (Santa Clara, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Methods and apparatus for processing a substrate are provided herein. For example, an apparatus for processing a substrate comprises a top delivery gas nozzle configured to direct process gas toward a substrate support surface of a substrate support an...