ALEXANDRIA, Va., Aug. 20 -- United States Patent no. 12,390,843, issued on Aug. 19, was assigned to Applied Materials Inc. (Santa Clara, Calif.).
"Rapid thermal processing (RTP) chamber outgassing removal" was invented by Wolfgang Aderhold (Santa Clara, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments disclosed herein include a method of monitoring a condition of a chamber. In an embodiment, the method comprises processing a substrate in the chamber, providing substrate history and chamber data to a model of the chamber, where the model of the chamber is configured to predict a chamber cleanliness, comparing the predicted chamber cleanliness against a performance limit, and flagging the cham...