ALEXANDRIA, Va., Aug. 20 -- United States Patent no. 12,392,427, issued on Aug. 19, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Insulated fluid lines in chemical mechanical polishing" was invented by Chad Pollard (San Jose, Calif.), Hari Soundararajan (Sunnyvale, Calif.), Paul D. Butterfield (San Jose, Calif.), Shou-Sung Chang (Mountain View, Calif.), Haosheng Wu (San Jose, Calif.), Calvin Lee (Oakland, Calif.) and Balasubramaniam Coimbatore Jaganathan (Bangalore, India).

According to the abstract* released by the U.S. Patent & Trademark Office: "A polishing assembly includes a chemical mechanical polishing system, a fluid source, and a fluid delivery conduit to carry a fluid from the fluid source into the chemical mech...