US Patent Issued to Applied Materials on Aug. 19 for "Benzyl compound passivation for selective deposition and selective etch protection" (California Inventors)

ALEXANDRIA, Va., Aug. 20 -- United States Patent no. 12,394,620, issued on Aug. 19, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Benzyl compound passivation for selective deposition and selective etch protection" was invented by Feng Q. Liu (San Jose, Calif.), Mark J. Saly (Santa Clara, Calif.) and David Thompson (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method includes forming a first layer and a second layer on a substrate, forming a passivation layer on a surface of the first layer without forming the passivation layer on a surface of the second layer by exposing the first layer and the second layer to a benzyl compound, and after forming the passivation layer on...