ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,387,956, issued on Aug. 12, was assigned to Applied Materials Inc. (Santa Clara, Calif.).
"Systems and methods for controlling non-uniformity" was invented by Gautam K. Hemani (San Jose, Calif.) and Khokan Chandra Paul (Cupertino, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Methods of controlling stress non-uniformity for semiconductor processing may include reflecting light off a surface of a wafer with an optical imaging device disposed within a cluster tool. The cluster tool may include a multi-chamber processing system. The methods may include collecting one or more color images of the surface of the wafer. The methods may include converti...