US Patent Issued to Applied Materials on Aug. 12 for "Methods of modeling and controlling pad wear" (California Inventor)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,384,003, issued on Aug. 12, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Methods of modeling and controlling pad wear" was invented by Sivakumar Dhandapani (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "In one embodiment, a method is provided for polishing a substrate. The method generally includes receiving a plurality of dwell times of a pad conditioning disk, wherein the plurality of dwell times are to be used in a pad conditioning process performed on a pad disposed on a platen, and each dwell time corresponding to a zone of a plurality of zones of the pad disposed on the platen, determining a plurality of total p...