US Patent Issued to Applied Materials on April 8 for "Residue measurement from machine learning based processing of substrate images" (California Inventors)

ALEXANDRIA, Va., April 9 -- United States Patent no. 12,272,047, issued on April 8, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Residue measurement from machine learning based processing of substrate images" was invented by Sivakumar Dhandapani (San Jose, Calif.), Arash Alahgholipouromrani (San Jose, Calif.), Dominic J. Benvegnu (La Honda, Calif.), Jun Qian (Sunnyvale, Calif.) and Kiran Lall Shrestha (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A neural network is trained for use in a substrate residue classification system by obtaining ground truth residue level measurements of a top layer of a calibration substrate at a plurality of locations, each location at a defin...