ALEXANDRIA, Va., June 9 -- United States Patent no. 12,288,677, issued on April 29, was assigned to Applied Materials Inc. (Santa Clara, Calif.).
"Vertically adjustable plasma source" was invented by Tsutomu Tanaka (Santa Clara, Calif.), Jared Ahmad Lee (San Jose, Calif.), Rakesh Ramadas (San Jose, Calif.), Dmitry A. Dzilno (Sunnyvale, Calif.), Gregory J. Wilson (Kalispell, Mont.) and Sriharish Srinivasan (Bangalore, India).
According to the abstract* released by the U.S. Patent & Trademark Office: "The disclosure describes a plasma source assemblies comprising a differential screw assembly, an RF hot electrode, a top cover, an upper housing and a lower housing. The differential screw assembly is configured to provide force to align the p...