US Patent Issued to APPLIED MATERIALS on April 29 for "Target profile for a physical vapor deposition chamber target" (Indian, American Inventors)

ALEXANDRIA, Va., June 9 -- United States Patent no. D1,072,774, issued on April 29, was assigned to APPLIED MATERIALS Inc. (Santa Clara, Calif.).

"Target profile for a physical vapor deposition chamber target" was invented by Shane Lavan (Santa Clara, Calif.), Madan Kumar Shimoga Mylarappa (Bengaluru, India), Sundarapandian Ramalinga Vijayalakshmi Reddy (Bangalore, India), Avinash Nayak (Bangalore, India), Wei Dou (Sunnyvale, Calif.), Yong Cao (San Jose, Calif.), Kirankumar Neelasandra Savandaiah (Bangalore, India) and Mingdong Li (Santa Clara, Calif.).

The patent was filed on Feb. 6, 2021, under Application No. D/769,610.

*For further information, including images, charts and tables, please visit: http://patft.uspto.gov/netacgi/nph-Pars...