US Patent Issued to Applied Materials on April 29 for "Quasi global cathode contact method for advanced patterning" (South Korean, Taiwanese, American Inventors)

ALEXANDRIA, Va., June 9 -- United States Patent no. 12,289,945, issued on April 29, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Quasi global cathode contact method for advanced patterning" was invented by Jungmin Lee (Santa Clara, Calif.), Yu Hsin Lin (Zhubei, Taiwan), Chung-Chia Chen (Hsinchu, Taiwan), Ji-young Choung (Hwaseong-si, South Korea), Dieter Haas (San Jose, Calif.) and Si Kyoung Kim (Gwangju-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments described herein relate to sub-pixel circuits and methods of forming sub-pixel circuits that may be utilized in a display such as an organic light-emitting diode (OLED) display. The sub-pixel circuit includes a plura...