US Patent Issued to Applied Materials on April 29 for "Pulsed DC power for deposition of film" (Indian, American Inventors)

ALEXANDRIA, Va., June 9 -- United States Patent no. 12,288,670, issued on April 29, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Pulsed DC power for deposition of film" was invented by Abhijeet Laxman Sangle (Maharashtra, India), Nilesh Patil (Dist Thane, India), Vijay Bhan Sharma (Rajasthan, India) and Visweswaren Sivaramakrishnan (Cupertino, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A vapor deposition system and methods of operation thereof are disclosed. The vapor deposition system includes a vacuum chamber; a dielectric target within the vacuum chamber, the dielectric target having a front surface and a thickness; a substrate support within the vacuum chamber, the substrate ...