US Patent Issued to APPLIED MATERIALS on April 29 for "Methods and apparatus for carbon compound film deposition" (American, Indian Inventors)

ALEXANDRIA, Va., June 9 -- United States Patent no. 12,288,672, issued on April 29, was assigned to APPLIED MATERIALS Inc. (Santa Clara, Calif.).

"Methods and apparatus for carbon compound film deposition" was invented by Qiwei Liang (Fremont, Calif.), Srinivas D. Nemani (Sunnyvale, Calif.), Chentsau Chris Ying (Cupertino, Calif.), Ellie Y. Yieh (San Jose, Calif.), Erica Chen (Sunnyvale, Calif.) and Nithin Thomas Alex (Bangalore, India).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method and apparatus for depositing a carbon compound on a substrate includes using an inductively coupled plasma (ICP) chamber with a chamber body, a lid, an interior volume, a pumping apparatus, and a gas delivery system and a...