ALEXANDRIA, Va., June 9 -- United States Patent no. 12,288,717, issued on April 29, was assigned to Applied Materials Inc. (Santa Clara, Calif.).
"Metal based hydrogen barrier" was invented by Srinivas Gandikota (Santa Clara, Calif.), Steven C. H. Hung (Sunnyvale, Calif.), Srinivas D. Nemani (Saratoga, Calif.), Yixiong Yang (Fremont, Calif.), Susmit Singha Roy (Campbell, Calif.) and Nikolaos Bekiaris (Campbell, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method of forming an electronic device is disclosed. The method comprises forming depositing a metal on a substrate, the metal comprising one or more of copper (Cu), titanium (Ti), or tantalum (Ta). A metal cap is deposited on the metal. The meta...