US Patent Issued to Applied Materials on April 22 for "Photoresist deposition using independent multichannel showerhead" (California Inventors)

ALEXANDRIA, Va., June 6 -- United States Patent no. 12,282,256, issued on April 22, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Photoresist deposition using independent multichannel showerhead" was invented by Farzad Houshmand (Mountain View, Calif.), Wayne French (San Jose, Calif.), Anantha Subramani (San Jose, Calif.), Kelvin Chan (San Ramon, Calif.), Lakmal Charidu Kalutarage (San Jose, Calif.) and Mark Joseph Saly (Milpitas, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Some embodiments include a method of depositing a photoresist onto a substrate in a processing chamber. In an embodiment, the method comprises flowing an oxidant into the processing chamber through a first path ...