ALEXANDRIA, Va., June 6 -- United States Patent no. 12,281,387, issued on April 22, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Method of depositing metal films" was invented by Feng Q. Liu (San Jose, Calif.), Mark Saly (Santa Clara, Calif.), David Thompson (San Jose, Calif.), Annamalai Lakshmanan (Fremont, Calif.), Avgerinos V. Gelatos (Scotts Valley, Calif.) and Joung Joo Lee (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Organometallic precursors and methods of depositing high purity metal films are discussed. Some embodiments utilize a method comprising exposing a substrate surface to an organometallic precursor comprising one or more of molybdenum (Mo), tungsten (W),...