US Patent Issued to Applied Materials on April 15 for "Plasma uniformity control system and methods" (California Inventors)

ALEXANDRIA, Va., June 5 -- United States Patent no. 12,278,089, issued on April 15, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Plasma uniformity control system and methods" was invented by Michael Andrew Stearns (San Jose, Calif.), Kartik Ramaswamy (San Jose, Calif.) and Carlaton Wong (Sunnyvale, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the present disclosure include an apparatus and methods for the plasma processing of a substrate. Some embodiments are directed to a plasma processing chamber. The plasma processing chamber generally includes a planar coil region comprising a plurality of planar coils, a first power supply circuit coupled to at least two of the ...