ALEXANDRIA, Va., Aug. 26 -- United States Patent no. 12,400,891, issued on Aug. 26, was assigned to APPLIED MATERIALS ITALIA S.R.L. (San Biagio di Callalta, Italy).
"Deposition apparatus, method of deposition on a substrate, substrate structure and substrate support" was invented by Francesca Antoniolli (Oderzo, Italy), Marco D'Acunzo (Quinto Di Treviso, Italy), Marco Galiazzo (Quinto Di Treviso, Italy) and Daniel Hada (Cupertino, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A deposition apparatus includes a first substrate support for supporting a substrate in a substantially vertical orientation. The substrate has a first main surface, a second main surface opposite the first main surface and a si...