US Patent Issued to Applied Materials Israel on Oct. 28 for "Electrical impedance measurement using an electron beam" (Israeli Inventors)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,455,254, issued on Oct. 28, was assigned to Applied Materials Israel Ltd. (Rehovot, Israel).

"Electrical impedance measurement using an electron beam" was invented by Alex Goldenshtein (Ness Ziona, Israel) and Dan Tuvia Fuchs (Rehovot, Israel).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for evaluating an impedance related value of a structure of a sample, the method includes: (i) performing a first illumination iteration that includes charging the structure with an illumination iteration charge; (ii) performing a second illumination iteration that includes imaging the structure to provide an image of the structure; a value of the illumination...