ALEXANDRIA, Va., June 12 -- United States Patent no. 12,299,868, issued on May 13, was assigned to Applied Materials Israel Ltd. (Rehovot, Israel).
"Control of a manufacturing process using contour curvature analysis of specimens" was invented by Einat Frishman (Rehovot, Israel), Ilan Ben-Harush (Tel-Aviv, Israel) and Rafael Bistritzer (Petach Tikva, Israel).
According to the abstract* released by the U.S. Patent & Trademark Office: "There is provided a system and a method comprising obtaining data Dcontour informative of a contour of an element of a semiconductor specimen acquired by an examination tool, using the data Dcontour to generate a signal informative of a curvature of the contour of the element, determining at least one of data...