ALEXANDRIA, Va., July 16 -- United States Patent no. 12,361,535, issued on July 15, was assigned to Applied Materials Israel Ltd. (Rehovot, Israel).
"Mask inspection for semiconductor specimen fabrication" was invented by Ronen Madmon (Mazkeret Batia, Israel), Ariel Shkalim (DN Sede-Gat, Israel) and Shani Ben Yacov (Tel Aviv, Israel).
According to the abstract* released by the U.S. Patent & Trademark Office: "There is provided a system and method for mask inspection, comprising: obtaining a plurality of images, each representative of a respective part of the mask; generating a CD map of the mask comprising a plurality of composite values of a CD measurement of a POI respectively derived from the plurality of images, comprising, for each g...