US Patent Issued to Applied Materials Israel on Feb. 10 for "In-line depth measurements by AFM" (Israeli Inventor)

ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,548,734, issued on Feb. 10, was assigned to Applied Materials Israel Ltd. (Rehovot, Israel).

"In-line depth measurements by AFM" was invented by Yehuda Zur (Tel-Aviv, Israel).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of evaluating a region of interest of a sample with a sample evaluation tool that includes a focused ion beam (FIB) column, a scanning electron microscope (SEM) column, and an atomic force microscope (AFM) instrument, the method comprising: transferring the sample into in a vacuum chamber of the sample evaluation tool; acquiring a plurality of two-dimensional images of the region of interest over a plurality of iterations of a ...