US Patent Issued to Applied Materials Israel on Feb. 10 for "Discharging an electrostatic chuck located within a vacuum chamber" (Israeli Inventors)

ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,548,730, issued on Feb. 10, was assigned to Applied Materials Israel Ltd. (Rehovot, Israel).

"Discharging an electrostatic chuck located within a vacuum chamber" was invented by Adam Faust (Rehovot, Israel) and Yosef Basson (Mazkeret-Batya, Israel).

According to the abstract* released by the U.S. Patent & Trademark Office: "A device for discharging an electrostatic chuck located within a vacuum chamber, the device includes a plasma distribution unit that is configured to receive plasma from an external plasma source that is located outside the vacuum chamber, and perform a distribution of the plasma within the vacuum chamber that discharges the electrostatic chuck. The device also in...