US Patent Issued to Applied Materials Israel on Dec. 2 for "End-to-end measurement for semiconductor specimens" (Israeli, Indian Inventors)

ALEXANDRIA, Va., Dec. 2 -- United States Patent no. 12,489,020, issued on Dec. 2, was assigned to Applied Materials Israel Ltd. (Rehovot, Israel).

"End-to-end measurement for semiconductor specimens" was invented by Tomer Haim Peled (Ness-Ziona, Israel), Bar Dubovski (Beit Hashmonay, Israel), Noam Tal (Kiryat Ono, Israel), Bobin Mathew Skaria (Bangalore, India), Boris Levant (Rehovot, Israel) and Tal Frank (Tel Aviv, Israel).

According to the abstract* released by the U.S. Patent & Trademark Office: "There is provided a system and method for examining a semiconductor specimen. The method includes obtaining a runtime image of the specimen, and providing the runtime image as an input to an end-to-end (E2E) learning model to process, thereby...