ALEXANDRIA, Va., Aug. 26 -- United States Patent no. 12,400,314, issued on Aug. 26, was assigned to Applied Materials Israel Ltd. (Rehovot, Israel).
"Mask inspection for semiconductor specimen fabrication" was invented by Ariel Shkalim (DN Sede-Gat, Israel) and Evgeny Bal (Natanya, Israel).
According to the abstract* released by the U.S. Patent & Trademark Office: "There is provided a system and method of a method of mask inspection, comprising: obtaining a first image representative of at least part of the mask; applying a printing threshold on the first image to obtain a second image; estimating a contour for each structural element of interest (SEI) of a group of SEIs, and extracting a set of attributes characterizing the contour, givi...