US Patent Issued to Applied Materials Israel on April 29 for "Entropy based image processing for focused ion beam delayer-edge slices detection" (Israeli Inventor)

ALEXANDRIA, Va., June 9 -- United States Patent no. 12,288,668, issued on April 29, was assigned to Applied Materials Israel Ltd. (Rehovot, Israel).

"Entropy based image processing for focused ion beam delayer-edge slices detection" was invented by Yuval Tsedek (Rehovot, Israel).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of delayering a sample that includes a second layer formed under a first layer, where the first and second layers are different materials or different texture, the method including: acquiring a plurality of gray scale images of the region of interest in an iterative process by alternating a sequence of delayering the region of interest with a first charged particle beam and imagi...