US Patent Issued to Applied Materials, Wayne State University on Oct. 7 for "Metal organonitrile precursors for thin film deposition" (Michigan, California Inventors)

ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,435,411, issued on Oct. 7, was assigned to Applied Materials Inc. (Santa Clara, Calif.) and Wayne State University (Detroit).

"Metal organonitrile precursors for thin film deposition" was invented by Thomas Joseph Knisley (Livonia, Mich.), Bhaskar Jyoti Bhuyan (San Jose, Calif.), Mark Saly (Santa Clara, Calif.), Shalini Tripathi (Detroit), Charles H. Winter (Bloomfield Hills, Mich.) and Zachary J. Devereaux (Webberville, Mich.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Metal complexes with nitrile ligands of the type MO2X2L2, where M is molybdenum or tungsten, X is a halogen, each L is independently an organonitrile ligand with the general formula NC...