US Patent Issued to Applied Materials, Wayne State University on Feb. 10 for "Deposition of rhenium-containing thin films" (Michigan, California Inventors)

ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,545,998, issued on Feb. 10, was assigned to Applied Materials Inc. (Santa Clara, Calif.) and Wayne State University (Detroit).

"Deposition of rhenium-containing thin films" was invented by Thomas Knisley (Livonia, Mich.), Keenan N. Woods (San Ramon, Calif.), Mark Saly (Santa Clara, Calif.), Stefan Cwik (Detroit) and Charles H. Winter (Bloomfield Hills, Mich.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods for depositing rhenium-containing thin films on a substrate are described. The substrate is exposed to a rhenium precursor and a reducing agent to form the rhenium-containing film (e.g., metallic rhenium, rhenium nitride). The exposures can be s...