US Patent Issued to Applied Materials, National University of Singapore on Sept. 16 for "Cycloheptatriene molybdenum (0) precursors for deposition of molybdenum films" (Singaporean Inventors)

ALEXANDRIA, Va., Sept. 17 -- United States Patent no. 12,416,076, issued on Sept. 16, was assigned to Applied Materials Inc. (Santa Clara, Calif.) and National University of Singapore (Singapore).

"Cycloheptatriene molybdenum (0) precursors for deposition of molybdenum films" was invented by Andrea Leoncini (Singapore), Paul Mehlmann (Singapore), Nemanja Dordevic (Singapore), Han Vinh Huynh (Singapore) and Doreen Wei Ying Yong (Singapore).

According to the abstract* released by the U.S. Patent & Trademark Office: "Molybdenum(0) coordination complexes comprising at least one cycloheptatriene ligand optionally one or more neutral ligands which coordinate to the metal center by carbon, nitrogen or phosphorous are described. Methods for depos...