US Patent Issued to Applied Materials, National University of Singapore on Jan. 27 for "Vapor-phase precursor seeding for diamond film deposition" (Singaporean, American Inventors)

ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,534,797, issued on Jan. 27, was assigned to Applied Materials Inc. (Santa Clara, Calif.) and National University of Singapore (Singapore).

"Vapor-phase precursor seeding for diamond film deposition" was invented by Sze Chieh Tan (Singapore), Vicknesh Sahmuganathan (Singapore), Eswaranand Venkatasubramanian (Santa Clara, Calif.), Abhijit Basu Mallick (Sunnyvale, Calif.), John Sudijono (Singapore), Jiteng Gu (Singapore) and Kian Ping Loh (Singapore).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods of depositing an adamantane film are described, which may be used in the manufacture of integrated circuits. Methods include processing a substrate in whic...