ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,435,421, issued on Oct. 7, was assigned to AP SYSTEMS INC. (South Korea).
"Apparatus and method for forming thin film" was invented by Pil Seong Jeong (Yongin-si, South Korea), Sang Hyun Ji (Yongin-si, South Korea), Chang Kyo Kim (Hwaseong-si, South Korea) and Dong Sik Kim (Suwon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided are an apparatus and method for forming a thin film. The apparatus for forming a thin film include a chamber configured to define a substrate processing space therein, a substrate support part connected to the chamber to support a substrate inside the chamber, a heat source part connected to the chamber to f...