ALEXANDRIA, Va., June 17 -- United States Patent no. 12,313,839, issued on May 27, was assigned to Anhui China Science MW Electronic Technology Co. Ltd. (Bengbu, China).
"MEMS micromirror with high duty cycle, micromirror array and preparation method thereof" was invented by Wei Li (Bengbu, China) and Jing Xu (Bengbu, China).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure provides a MEMS micromirror with a high duty cycle, a micromirror array, and a preparation method thereof, wherein a plurality of first movable combs and a plurality of first fixed combs of the MEMS micromirror are located under the silicon layer of the reflector, which improves the duty cycle and effectively reduces th...