US Patent Issued to American Air Liquide on Oct. 7 for "Indium precursors for vapor depositions" (Delaware Inventors)

ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,435,096, issued on Oct. 7, was assigned to American Air Liquide Inc. (Fremont, Calif.).

"Indium precursors for vapor depositions" was invented by Kayla Diemoz (Wilmington, Del.), Bradley McKeown (Wilmington, Del.), Claudia Fafard (Newark, Del.) and Venkateswara R. Pallem (Hockessin, Del.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed are indium (In)-containing film forming compositions comprising In(III)-containing precursors that contain halogens, methods of synthesizing them and methods of using them to deposit the indium-containing films and/or indium-containing alloy film. The disclosed In(III)-containing precursors contain chlorine with ni...