US Patent Issued to Ambature on Oct. 7 for "Extremely low resistance films and methods for modifying or creating same" (Arizona Inventors)

ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,437,900, issued on Oct. 7, was assigned to Ambature Inc. (Scottsdale, Ariz.).

"Extremely low resistance films and methods for modifying or creating same" was invented by Douglas J. Gilbert (Flagstaff, Ariz.) and Timothy S. Cale (Phoenix).

According to the abstract* released by the U.S. Patent & Trademark Office: "Operational characteristics of an extremely low resistance ("ELR") film comprised of an ELR material may be improved by depositing a modifying material onto appropriate surfaces of the ELR film to create a modified ELR film. In some implementations of the invention, the ELR film may be in the form of a "c-film." In some implementations of the invention, the ELR film may be in...