US Patent Issued to Ambarella International on July 1 for "Extrinsic parameter calibration for 4D millimeter-wave radar and camera based on adaptive projection error" (Chinese Inventors)

ALEXANDRIA, Va., July 3 -- United States Patent no. 12,345,806, issued on July 1, was assigned to Ambarella International LP (Santa Clara, Calif.).

"Extrinsic parameter calibration for 4D millimeter-wave radar and camera based on adaptive projection error" was invented by Sicong Lyu (Shanghai) and Liangliang Wang (Shanghai).

According to the abstract* released by the U.S. Patent & Trademark Office: "An apparatus comprises an interface and a processor. The interface may be configured to receive pixel data representing a first field of view of a camera and four-dimensional (4D) point cloud data representing a second field of view of a 4D imaging radar sensor. The first field of view of the camera and the second field of view of the 4D imagi...