US Patent Issued to Amazon Technologies on Oct. 14 for "Large language model (LLM)-based correction based on a multi-tool prompt" (Washington Inventor)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,444,412, issued on Oct. 14, was assigned to Amazon Technologies Inc. (Seattle).

"Large language model (LLM)-based correction based on a multi-tool prompt" was invented by Deepak Babu Rajaram Piskala (Bellevue, Wash.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Techniques for large language model (LLM)-based correction based on a multi-tool prompt are described. In an example, a computer system receives, via a user interface, user input including user-provided information and indicating a request for a task to be performed on the user-provided information. The computer system generates, by using an LLM associated with a prompt, a first input to a first...