ALEXANDRIA, Va., June 12 -- United States Patent no. 12,299,864, issued on May 13, was assigned to Amazon Technologies Inc. (Reno, Nev.).
"Localized defect detection" was invented by Ali Takbiriborujeni (Lynnwood, Wash.), Mehdi Eftekhari Far (Issaquah, Wash.) and Mahesh Viswanathan (White Plains, N.Y.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Images classified as including defects can be analyzed using localized anomaly detection to determine which regions of the images contributed to the classification. These techniques may identify one or more regions of the images having a confidence value exceeding a threshold or range as a factor in the classification. Using a number of different localized anomaly ...