US Patent Issued to Amazon Technologies on March 11 for "Machine learning framework for personalized clothing compatibility" (California, Washington, New York Inventors)

ALEXANDRIA, Va., March 12 -- United States Patent no. 12,248,872, issued on March 11, was assigned to Amazon Technologies Inc. (Seattle).

"Machine learning framework for personalized clothing compatibility" was invented by Anurag Beniwal (Redmond, Wash.), Meet Taraviya (Los Angeles), Yen-Liang Lin (Aliso Viejo, Calif.) and Larry Davis (Brooklyn, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Systems and methods are described for recommending pairs or sets of clothing items for an individual to wear together, including learning a compatibility metric personalized to each individual. A framework is used to learn compatibility that is personalized to the user based on initial item feedback that may be rece...