ALEXANDRIA, Va., June 18 -- United States Patent no. 12,327,280, issued on June 10, was assigned to AMAZON TECHNOLOGIES INC. (Seattle).
"Method and system for outfit simulation using layer mask" was invented by Benjamin James Biggs (San Francisco), Philip Pinette (Seattle), Charu Kothari (San Jose, Calif.), Caitlin Isaac Cagampan (Pasadena, Calif.), Gerard Guy Medioni (Los Angeles), Achal Dushyant Dave (San Francisco) and Scott Chenghui Sun (Milpitas, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method includes generating a virtual model of a human body based at least in part on a selected image of the human body and generating a segment of an article of clothing based at least in part on a select...