US Patent Issued to AIXTRON on Oct. 7 for "Method for recording a state of a CVD reactor under production conditions" (German Inventors)

ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,435,422, issued on Oct. 7, was assigned to AIXTRON SE (Herzogenrath, Germany).

"Method for recording a state of a CVD reactor under production conditions" was invented by Pascal Tillmanns (Monschau, Germany), Oliver Schon (Herzogenrath, Germany), Thomas Schmitt (Monchengladbach, Germany) and Peter Sebald Lauffer (Aachen, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "During a process involving one or more process steps of a process phase, in which a substrate is located in the process chamber of a CVD reactor, a process temperature and a pressure are each set and a process gas flow is fed into the process chamber by way of control data delivered ...