ALEXANDRIA, Va., June 16 -- United States Patent no. 12,305,282, issued on May 20, was assigned to AIXTRON SE (Herzogenrath, Germany).

"Susceptor of a CVD reactor" was invented by Wilhelm Josef Thomas Krucken (Aachen, Germany) and Peter Sebald Lauffer (Aachen, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "A susceptor for a CVD reactor includes a bearing surface for supporting a substrate holder. A carrier gas is fed into an inner radial zone, in order to floatingly cushion a substrate holder supported above the bearing surface. The gas fed into the inner radial zone leaves a second radial zone through discharge channels and to a slight extent through a gap surrounding the second radial zone and assi...