US Patent Issued to AIXTRON on Feb. 25 for "CVD reactor with carrying ring for substrate handling, and use of a carrying ring on a CVD reactor" (British, German Inventors)

ALEXANDRIA, Va., Feb. 26 -- United States Patent no. 12,234,553, issued on Feb. 25, was assigned to AIXTRON SE (Herzogenrath, Germany).

"CVD reactor with carrying ring for substrate handling, and use of a carrying ring on a CVD reactor" was invented by Benjamin David Wright (Cambridge, Great Britain) and Barry O'Neil (Herzogenrath, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "A susceptor assembly, which is situated in a reactor housing, has at least one wide side plane that faces a process chamber, at least one pocket, and a carrying element that lies in the at least one pocket, for carrying and handling a substrate. An upper face of the carrying element is adjacent to a limiting face of a recess i...