US Patent Issued to Air Water on Dec. 2 for "Compound semiconductor substrate and method for manufacturing compound semiconductor substrate" (Japanese Inventors)

ALEXANDRIA, Va., Dec. 2 -- United States Patent no. 12,490,486, issued on Dec. 2, was assigned to Air Water Inc. (Osaka, Japan).

"Compound semiconductor substrate and method for manufacturing compound semiconductor substrate" was invented by Sumito Ouchi (Azumino, Japan) and Keisuke Kawamura (Azumino, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A compound semiconductor substrate and a method for manufacturing the compound semiconductor substrate including the steps of forming an electronic traveling layer consisting of a first nitride semiconductor, forming a barrier layer consisting of a second nitride semiconductor with a wider band gap than a band gap of the first nitride semiconductor on the ele...