US Patent Issued to AGC on Aug. 19 for "Method for producing difluoromethyl-substituted aromatic heterocyclic compound" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 20 -- United States Patent no. 12,391,649, issued on Aug. 19, was assigned to AGC Inc. (Tokyo).

"Method for producing difluoromethyl-substituted aromatic heterocyclic compound" was invented by Yoshitaka Nomura (Tokyo) and Eiichiro Anraku (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for a high yield production of a difluoromethyl-substituted aromatic heterocyclic compound having a partial structure represented by formula (II), which includes reacting an N-oxido aromatic heterocyclic compound having a partial structure represented by formula (I) with tetrafluoroethylene in a solvent selected from an aromatic hydrocarbon solvent, an ester solvent, and an ether solvent." ...