US Patent Issued to Aeva on May 13 for "Techniques for point cloud frame accumulation in FMCW LIDAR" (California, Virginia Inventors)

ALEXANDRIA, Va., June 12 -- United States Patent no. 12,298,402, issued on May 13, was assigned to Aeva Inc. (Mountain View, Calif.).

"Techniques for point cloud frame accumulation in FMCW LIDAR" was invented by Bruno Hexsel (Mountain View, Calif.), Heethesh Vhavle Naresh (Sunnyvale, Calif.), Kumar Bhargav Viswanatha (Santa Clara, Calif.), Mina Rezk (Haymarket, Va.) and James Reuther (San Francisco).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method generates first points based on a first scan of an environment that includes one or more moving objects. The method transforms the first points into a first static frame, which includes removing one or more of the first points corresponding to the one or more...