US Patent Issued to ADVANCED MICRO-FABRICATION EQUIPMENT on March 25 for "Plasma treatment apparatus, lower electrode assembly and forming method thereof" (Chinese Inventors)

ALEXANDRIA, Va., March 26 -- United States Patent no. 12,261,012, issued on March 25, was assigned to ADVANCED MICRO-FABRICATION EQUIPMENT INC. (Shanghai).

"Plasma treatment apparatus, lower electrode assembly and forming method thereof" was invented by Tuqiang Ni (Shanghai), Sheng Guo (Shanghai), Xiang Sun (Shanghai), Guangwei Fan (Shanghai), Kuan Yang (Shanghai), Hongqing Wang (Shanghai), Xingjian Chen (Shanghai) and Ruoxin Du (Shanghai).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a plasma treatment apparatus, a lower electrode assembly and a forming method thereof, wherein the lower electrode assembly includes: a base for carrying a substrate to be treated; a focus ring encircling a periphe...